Materials Science & Engineering
Main
PhD: Materials Engineering, Technion, 2007
MSc: Materials Engineering, Technion, 2003
BSc: Materials Engineering, Technion, 2001
PhD: Nanoscience Centre, University of Cambridge, 2011
MSc: Physics, Weizmann Institute of Science, 2006
BSc: Combined Physics and Chemistry Program, Hebrew University. 2003
Nano Main Field: Nano fabrication, nano-characterizing and nano devices.
Ph.D.: Technion, 1994
M.Sc.: Materials Engineering, Technion 1991
B.Sc.: Mechanicalo Engineering, Technion 1989
Main Nano Field: ceramic-matrix nanocomposites, atomistic structure and chemistry at interfaces, thermodynamics of interfaces, advanced electron microscopy for characterization
Research Interests:
Wetting and interfaces between metals and ceramics
Nanometer-thick equilibrium amorphous films
Ph.D.: Weizmann 1999
M.Sc.: Chemistry, The Hebrew University of Jerusalem 1993
B.Sc.: Chemistry, The Hebrew University of Jerusalem 1991
Main Nao Field
Design, synthesis and characterization of novel conjugated polymer/inorganic nanocomposites for electronic devices.
Coassembly of organic and inorganic precursors with molecular level control.
Research Interestes
Conducting and Semiconducting polymers
Ph.D.: Technion 1977
B.Sc.: Physics, Technion 1969
Main nano field
Silicon technology at the nanoscale.
Research Interestes
Self Assembled Diffusion Barriers for Copper Metallization in Advanced Microelectronic Devices.
Properties of HfO2 based high-k dielectrics.
Tuning of Fermi Level Position at Metal/High-k Dielectric Interfaces.
Metal / Crystalline Lanthanide Oxides – A New Gate Stack for Advanced Si Devices.
B.Sc. 1983 (Technion)
D.Sc. 1990 (Technion)
Main Nano area: Dielectric properties of nanometer-sized particles
Postdoctoral, Institute of Chemical Engineering and Applied Chemistry, University of Toronto, Canada
Ph.D. in Applied Chemistry (2003), Casali Institute of Applied Chemistry, Hebrew University of Jerusalem, Israel. (M.Sc. equivalency to direct access to Ph.D. program between 1998-1999)
