Industry

Focused Ion Beam

Focused Ion Beam

FEI Helios NanoLab DualBeam G3 UC

 

Academic supervisor: Prof. Wayne D. Kaplan, Kaplan@technion.ac.il

Lab manager: Dr. Larisa Popilevsky, slotus@technion.ac.il, 077-8875144

registration system: http://rbnibook.catom.com/

The dual-beam focused ion beam (FIB) at the Technion was purchased with the support of the Russell Berrie Nanotechnology Institute.

The Helios NanoLab G3 series DualBeam systems integrate ion and electron beams for FIB and SEM functionality in one machine. It enables switching between the two beams for quick and accurate navigation and milling. The convergence of the SEM and FIB at short working distance.

The FEI Helios NanoLab DualBeam allows fastest TEM sample preparation performance and allows highly flexible failure analysis capability and “slice-and-view” cross-sectioning at high resolution. This SEM/FIB combines the most advanced scanning electron microscope (SEM) and focused ion beam (FIB) technologies with innovative gas chemistries, detectors, and manipulators. Featuring unsurpassed SEM resolution, image quality and Tomahawk™ FIB performance, imaging, milling, or preparing samples is fast and easy for semiconductor and data storage labs, research facilities and industrial applications.

The Helios NanoLab G3 is equipped with EDS and EBSD, enabling 3D tomography. The

Helios NanoLab G3 features:

*Ultra-high resolution Elstar™ electron column with the UniColor source mode. 

*High-resolution Tomahawk™ ion column with ICE (in chamber electronics) ion detector. 

*The chamber and stage accommodate up to 100 mm samples. 

*The high accuracy five-axis X, Y, Z, Rotation, Tilt) stage provides full coverage of 100 mm samples with computer control and automation of all axes for precise sample manipulation. 

*The FEI EasyLift NanoManipulator supports higher yields for TEM sample lift-out through an intuitive, integrated user interface and attachment to a TEM grid for further analysis. It allows for the final thinning of the sample to be accomplished after attachment to the TEM grid holder. 

*Gas Injection System (GIS) – Advanced control of gas chemistries including FEI proprietary gases for enhanced precision deposition or bulk material removal. 

*Auto Slice & view software provides a fully automated recipe for accurate slice and view. 

*NanoBuilder allows the creation of structures that are not possible with other lithographic methods. Users can modify their designs faster and results in quicker iteration than the traditional lithography process.

System specifications -see the below file